This paper presents the CFD-aided design for polysilicon production system that utilizes an innovative technique of silicon tube-based CVD process. Virtual experiment has been conducted, which involves the development of a complex computational model capable of describing multi-component fluid flow, gas/surface chemistry, conjugate heat transfer, thermal radiation, and species transport. Theoretical analysis has been conducted and a desirable velocity regime for silane and hydrogen mixture has been found. The simulations of the flow field, temperature and species transport have been performed for various reactor geometries, operating conditions (e.g., flow rates of primary silane and secondary hydrogen gases), and heating power design. The deposition rate of polysilicon has been derived analytically as well as computationally. The effects of various conditions on deposition rate have been investigated, and optimal geometry and operating conditions have been obtained for the targeted deposition rate.

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